Research
Our researchers are experts in high-frequency communication systems, and our university facilities provide unique infrastructure to perform advanced research into problems that impact industry and the world at large.
Thrust Areas
- High-Frequency Nitride Materials and Devices
- Nanomaterial-Based Devices for Communication
- Integrated Microwave Photonics
- Global Modeling of High-Frequency Components
- Super High Resolution Imaging
- Ultra-Wide-Band Communications
Our Facilities
The University of Arkansas, University of Tennessee – Knoxville, and Florida International University have advanced material growth facilities, cleanrooms and material, device, and circuit characterization equipment.
UHV-PE-CVD Machine
Ultra-high vacuum plasma-enhanced chemical vapor deposition UHV-PE-CVD machine
Molecular Beam Epitaxy
Molecular beam epitaxy (MBE) growth machines and material-characterization facilities
Diffractometers
Bruker IFS66 FTIR FT-Raman/PL, X-ray Diffractometer
Optical Microscopy
Optical Microscopy Hall Effect System, XPS, AFM, 4-probe low-temp
Photoluminescence & Raman Systems
UV-Visible-NIR Photoluminescence (PL) and Raman system, Mid-IR Micro-PL system
Microwave Circuits
Microwave circuits and RF test equipment
Anechoic Chamber
Designed to completely absorb reflections of either sound or electromagnetic waves
UWB, Antenna & Radar Labs
Workspace for many advanced research projects.
Image Processing Lab
Advanced Imaging and Collaborative Information Processing
Robotics, AI
Imaging, Robotics, and Intelligent Systems
2D materials
2D materials– growth and physics
Organic Semiconductors
Novel electronic devices based on emerging materials